Bandpass filter by a stretch and double-exposure technique
Zhou KM ; An G ; Ge H ; Wang W ; Zhang L ; Bennion I
1998
会议名称conference on fiber optics components and optical communication ii
会议日期sep 18-19, 1998
会议地点beijing, peoples r china
页码49-54
通讯作者zhou km chinese acad sci inst semicond natl res ctr optoelect technol beijing 100083 peoples r china.
中文摘要we fabricated a bandpass filter based on moire bragg grating in fiber with a uniform phase mask we employed a stretch and two-exposure technique, in which the fiber was exposed to uv light from a krf excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the bragg wavelength of these two gratings.applying different stretch can control the bandpass width of the filter. we measured the stretch characterization of a uniform bragg grating and found the bragg wavelength of the grating shifts linearly with the stretched length.we theoretically analyzed the grating structure and its reflection spectrum. the filter's characteristics can be optimized by choosing appropriate parameters. we will give a theoretical discussion concerning which parameters and how they affect the filter's operation.
英文摘要we fabricated a bandpass filter based on moire bragg grating in fiber with a uniform phase mask we employed a stretch and two-exposure technique, in which the fiber was exposed to uv light from a krf excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the bragg wavelength of these two gratings.applying different stretch can control the bandpass width of the filter. we measured the stretch characterization of a uniform bragg grating and found the bragg wavelength of the grating shifts linearly with the stretched length.we theoretically analyzed the grating structure and its reflection spectrum. the filter's characteristics can be optimized by choosing appropriate parameters. we will give a theoretical discussion concerning which parameters and how they affect the filter's operation.; 于2010-10-29批量导入; made available in dspace on 2010-10-29t06:37:16z (gmt). no. of bitstreams: 1 3026.pdf: 737680 bytes, checksum: 5433a3c5fb1cafcc0e1ce041f243cb3b (md5) previous issue date: 1998; spie int soc opt engn.; cos.; coema.; chinese acad sci, inst semicond, natl res ctr optoelect technol, beijing 100083, peoples r china
收录类别CPCI-S
会议主办者spie int soc opt engn.; cos.; coema.
会议录fiber optic components and optical communications ii, 3552
会议录出版者spie-int soc optical engineering ; 1000 20th st, po box 10, bellingham, wa 98227-0010 usa
会议录出版地1000 20th st, po box 10, bellingham, wa 98227-0010 usa
学科主题光电子学
语种英语
ISSN号0277-786x
ISBN号0-8194-3013-7
内容类型会议论文
源URL[http://ir.semi.ac.cn/handle/172111/13847]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhou KM,An G,Ge H,et al. Bandpass filter by a stretch and double-exposure technique[C]. 见:conference on fiber optics components and optical communication ii. beijing, peoples r china. sep 18-19, 1998.
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