Evaluation of growth mode and optimization of growth parameters for GaAs epitaxy in V-shaped

	Evaluation of growth mode and optimization of growth parameters for GaAs epitaxy in V-shaped
	Shiyan Li ; Xuliang Zhou ; Xiangting Kong ; Mengke Li ; Junping Mi ; Jing Bian ; Wei Wang ; Jiaoqing Pan
刊名	journal of crystal growth
	2015
卷号	426 页码:147-152
学科主题	半导体材料
收录类别	SCI
语种	英语
公开日期	2016-03-23
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/26803]
专题	半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式 GB/T 7714	Shiyan Li,Xuliang Zhou,Xiangting Kong,et al. Evaluation of growth mode and optimization of growth parameters for GaAs epitaxy in V-shaped[J]. journal of crystal growth,2015,426:147-152.
APA	Shiyan Li.,Xuliang Zhou.,Xiangting Kong.,Mengke Li.,Junping Mi.,...&Jiaoqing Pan.(2015).Evaluation of growth mode and optimization of growth parameters for GaAs epitaxy in V-shaped.journal of crystal growth,426,147-152.
MLA	Shiyan Li,et al."Evaluation of growth mode and optimization of growth parameters for GaAs epitaxy in V-shaped".journal of crystal growth 426(2015):147-152.