Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds

	Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds
	N. I. Fainer ; A. A. Nemkova
刊名	high energy chemistry
	2015
卷号	49 期号:4 页码:273–281
学科主题	光电子学
收录类别	SCI
语种	英语
公开日期	2016-03-22
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/26727]
专题	半导体研究所_光电子研究发展中心
推荐引用方式 GB/T 7714	N. I. Fainer,A. A. Nemkova. Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds[J]. high energy chemistry,2015,49(4):273–281.
APA	N. I. Fainer,&A. A. Nemkova.(2015).Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds.high energy chemistry,49(4),273–281.
MLA	N. I. Fainer,et al."Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds".high energy chemistry 49.4(2015):273–281.