| 题名 | 扫描干涉场曝光系统干涉条纹测量与调整方法研究 |
| 作者 | 姜珊 |
| 学位类别 | 博士 |
| 答辩日期 | 2015-05 |
| 授予单位 | 中国科学院大学 |
| 导师 | 巴音贺希格 |
| 关键词 | 全息光栅 扫描干涉场曝光系统 曝光对比度 干涉条纹 曝光刻线相位 光栅周期 |
| 其他题名 | Study on Measurement and Adjustment of Interference Fringes for Scanning Beam Interference Lithography System |
| 学位专业 | 光学 |
| 中文摘要 | 大尺寸衍射光栅在很多科学技术领域都有很重要的应用。通过传统的单次曝光制造大尺寸、高质量的全息光栅受到曝光系统中透镜口径的限制。扫描干涉场曝光系统在制作方法上融合了全息曝光、激光直写以及机械刻划的部分特点，是近年来新兴的一种全息光栅制作方法。系统的基本工作原理为两束小尺寸的高斯光束在光栅基底表面形成干涉场，光栅基底置于二维工作台上随之进行二维运动，从而曝光得到大尺寸的全息光栅。扫描干涉场曝光系统本质上是通过动态扫描、步进拼接的方式曝光拼接得到全息光栅，干涉场中的干涉条纹的形态会以能量积分的形式记录至光刻胶上，干涉条纹的形态会直接或间接影响全息曝光对比度及刻线误差。因此，对干涉条纹存在的误差对扫描曝光的影响进行分析，并对其进行测量和调整十分必要。论文主要包括以下内容。 第一，分析了扫描干涉场曝光系统中干涉条纹方向与扫描方向之间的夹角对扫描曝光对比度的影响，提出了基于基准光栅的干涉条纹方向调整方法并分析了该方法理论上实施的可行性。利用光栅的相移特性，并采用光束对准将干涉条纹方向调整至20μrad以内。第二，对干涉条纹相位非线性误差的影响因素进行分析，并分析了干涉条纹相位非线性误差对扫描曝光的影响，给出了干涉条纹相位非线性误差的精确测量及调整方法。第三，分析了干涉场内干涉条纹周期测量误差对曝光对比度的影响，并根据扫描干涉场中的曝光及显影模型，给出了光栅掩模槽形随周期测量误差的变化规律。分析了干涉条纹周期测量误差对扫描曝光刻线相位的影响，给出了光栅周期及曝光刻线误差随周期测量误差的变化规律，得到干涉条纹周期的测量误差容限。第四，根据扫描干涉场曝光系统的特点提出了分束棱镜移动测量干涉条纹周期的方法，根据高斯光束传播理论，分析了该方法的理论误差；提出了周期计数法和离散傅里叶变换法对周期测量数据进行计算。同时，为降低对系统二维工作台运行及稳定精度的要求，提出了小行程高精度位移台辅助测量周期的方法，得到小行程位移台辅助周期测量的重复性达到10.8ppm（σ值）。 本论文对扫描干涉场曝光系统中的干涉条纹的测量及调整方法进行了深入的研究，这是扫描曝光法制作大尺寸全息光栅的基础，对系统的研制和全息光栅的制作具有重要意义。 |
| 英文摘要 | Large-size diffraction gratings have very important applications in many areas of science and technology. It is limited by aperture of lens in exposure system for manufacturing large, high-quality holographic gratings by conventional single exposure. Scanning beam interference lithography system combines some features of the traditional interference lithography, laser direct writing and mechanical ruling in the manufacturing method. It is a new method of making holographic gratings in recent years. The basic working principle of the system is that by interfering two small diameter Gaussian laser beams to produce a grating image, it produces large holographic gratings by step-and-scanning the substrate on the stage. It is essentially making gratings by dynamic scanning and stepping mosaic exposure in scanning beam interference lithography system. Interference fringes are recorded to the photoresist in the form of energy integral and their pattern will directly or indirectly affects the dose contrast and printed error. Thus, it is necessary to analyze the effects of interference fringes errors on exposure dose, measure and adjust these errors. Thesis includes the following contents. Firstly, the influence of the angle between fringe direction and scanning direction on dose contrast in Scanning beam interference lithography system is analyzed. Method of fringe direction adjustment based on the metrology grating is proposed and its feasibility is theoretically analyzed. Taking advantage of grating phase shift property and beam alignment, the angle of fringes direction is adjusted to less than 20μrad. Secondly, factors affecting the interference fringes nonlinear phase error and the effects of fringes nonlinear phase errors on the scanning exposure dose are analyzed. Accurate measurement and adjustment method of fringes nonlinear phase error is given. Thirdly, effects of measure interference fringe period error on dose contract are analyzed. According to the exposure and development model of scanning beam interference lithography, variation of groove profile with measured fringe period error is given. The effect of the measured fringe period error on printed phase is analyzed and variations of printed error and lithography grating period are given. And then the tolerance of measured interference fringe period error is obtained. Fourthly, according to the characteristics of scanning beam interference lithography system, method of measuring the fringe period with a beam splitter movement is proposed. Based on Gaussian beam propagation theory, the theoretical error of this method is analyzed. Period counting and discrete Fourier transformation method is applied to calculate fringe period. In order to make it easy for two-dimension stage design, measuring period by short-stroke linear stage’s assistance is put forward and experiments are done. Experiment results show that the period measurement repeatability is 10.8 part-per-million (1σ). In this paper, measurement and adjustment of interference fringes in scanning beam interference lithography system is researched in depth. This is the basis for scanning lithography to produce Large-size holographic grating. It is important to develop the system and produce holographic gratings. |
| 公开日期 | 2015-12-24 |
| 内容类型 | 学位论文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/48849]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | 姜珊. 扫描干涉场曝光系统干涉条纹测量与调整方法研究[D]. 中国科学院大学. 2015. |
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